nan
ac7f5a7f6d
- Replace Delete Geometry with Separate Geometry in O Image Depth Panorama to manage low and high mask areas independently. - Adjust depth processing to ensure low mask regions are displaced to Dome Radius while high mask regions follow existing depth rules. - Update tests to validate new behavior, ensuring outputs align with expected results for both mask states. - Enhance material handling by introducing emission strength in the shadeless group.
3 lines
40 B
YAML
3 lines
40 B
YAML
schema: spec-driven
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created: 2026-09-16
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