- Introduced a new design for selection rasterization that decouples the selection geometry from the image content, ensuring that the SelectionMask is independent of the source image's alpha and color.
- Updated the `rasterize_selection_path` function to only accept selection paths and image dimensions, removing parameters related to source alpha and alpha thresholds.
- Implemented a new approach for handling selection paths using non-zero winding fill, ensuring overlapping areas are preserved.
- Enhanced performance by utilizing a scanline algorithm for rasterization, significantly reducing processing time for high-resolution images.
- Updated internal documentation and added comprehensive tests to validate the new behavior and performance improvements.
- Ensured backward compatibility by maintaining existing interfaces where necessary while introducing breaking changes in the selection processing logic.
- Added interaction helpers for cutout region validation and shape menu interaction.
- Created main operator for converting image regions into cutout shapes, including AI artifact generation.
- Introduced object creation logic for cutout shapes, handling depth and normal textures.
- Defined cutout shape identifiers and node groups for various shape types.
- Implemented depth texture writing and prediction artifact generation for MoGe-2.
- Developed server jobs for generating cutout artifacts, depth planes, and refining image regions.
- Added region refinement logic to enhance gesture masks using BEN2.
